Nelson Felix

Publications

• Inorganic hardmask development for EUV patterning

  • • Anuja De Silva
    • A. Dutta
    • et al.
  • 2018
  • SPIE Advanced Lithography 2018

• Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning

  • • Angelique Raley
    • Joe Lee
    • et al.
  • 2018
  • SPIE Advanced Lithography 2018

• Defect detection strategies and process partitioning for SE EUV patterning

  • • Luciana Meli
    • Karen Petrillo
    • et al.
  • 2018
  • SPIE Advanced Lithography 2018

• The integration of 193i and DSA for BEOL metal cuts/blocks targeting sub-20nm tip-to-tip CD

  • • Chi-Chun Liu
    • Yann Mignot
    • et al.
  • 2018
  • SPIE Advanced Lithography 2018

• Detection of Printable EUV Mask Absorber Defects and Defect Adders by Full Chip Optical Inspection of EUV Patterned Wafers

  • • Luciana Meli
    • Ravi Bonam
    • et al.
  • 2017
  • IEEE Trans Semicond Manuf

• Development of amorphous silicon based EUV hardmasks through physical vapor deposition

  • • Anuja De Silva
    • Yann Mignot
    • et al.
  • 2017
  • SPIE Photomask Technology + EUV Lithography 2017

• Coater/developer based techniques to improve high-resolution EUV patterning defectivity

  • • Koichi Hontake
    • Lior Huli
    • et al.
  • 2017
  • SPIE Photomask Technology + EUV Lithography 2017

• Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET

  • • N. Loubet
    • T.B. Hook
    • et al.
  • 2017
  • VLSI Technology 2017

• Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer

  • • Indira Seshadri
    • Anuja De Silva
    • et al.
  • 2017
  • J. Micro/Nanolithogr. MEMS MOEMS

• Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition

  • • Anuja De Silva
    • Indira Seshadri
    • et al.
  • 2017
  • J. Micro/Nanolithogr. MEMS MOEMS