Nelson Felix

Publications

• EUV mask challenges and requirements for ultimate single exposure interconnects

  • • Chris Progler
    • Michael Green
    • et al.
  • 2019
  • SPIE Advanced Lithography 2019

• The defect mitigation on EUV stack by track based technology

  • • Naoki Shibata
    • Lior Huli
    • et al.
  • 2019
  • SPIE Advanced Lithography 2019

• Patterning material challenges for improving euv stochastics

  • • Anuja De Silva
    • Luciana Meli
    • et al.
  • 2019
  • J. Photopolym. Sci. Tech.

• Inorganic hardmask development for extreme ultraviolet patterning

  • • Anuja De Silva
    • A. Dutta
    • et al.
  • 2019
  • J. Micro/Nanolithogr. MEMS MOEMS

• Defect detection strategies and process partitioning for single-expose EUV patterning

  • • Luciana Meli
    • Karen Petrillo
    • et al.
  • 2019
  • J. Micro/Nanolithogr. MEMS MOEMS

• Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning

  • • Angelique Raley
    • Joe Lee
    • et al.
  • 2019
  • J. Micro/Nanolithogr. MEMS MOEMS

• Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

  • • Charlie Liu
    • Elliott Franke
    • et al.
  • 2018
  • Nature Electronics

• Study of resist hardmask interaction through surface activation layers

  • • Anuja De Silva
    • Luciana Meli
    • et al.
  • 2018
  • EUVL 2018

• Track based techniques to improve high-resolution EUV patterning defectivity

  • • Naoki Shibata
    • Lior Huli
    • et al.
  • 2018
  • EUVL 2018

• Polymer brush as adhesion promoter for EUV patterning

  • • Jing Guo
    • Anuja De Silva
    • et al.
  • 2018
  • SPIE Advanced Lithography 2018