Nelson Felix

Publications

• Strategies to enable directed self-Assembly contact hole shrink for tight pitches

  • • Kristin Schmidt
    • Hitoshi Osaki
    • et al.
  • 2016
  • SPIE Advanced Lithography 2016

• DSA patterning options for FinFET formation at 7nm node

  • • Chi Chun Liu
    • Elliott Franke
    • et al.
  • 2016
  • SPIE Advanced Lithography 2016

• Through-pellicle defect inspection of EUV masks using an ArF-based inspection tool

  • • Dario Goldfarb
    • William Broadbent
    • et al.
  • 2016
  • SPIE Advanced Lithography 2016

• EUV patterning successes and frontiers

  • • Nelson Felix
    • Daniel Corliss
    • et al.
  • 2016
  • SPIE Advanced Lithography 2016

• Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)

  • • R. Muthinti
    • Nicolas Loubet
    • et al.
  • 2016
  • SPIE Advanced Lithography 2016

• Assessments of image-based and scatterometry-based overlay targets

  • • Chiew-Seng Koay
    • Nelson Felix
    • et al.
  • 2016
  • SPIE Advanced Lithography 2016

• Advanced in-line metrology strategy for self-aligned quadruple patterning

  • • Robin Chao
    • Mary Breton
    • et al.
  • 2016
  • SPIE Advanced Lithography 2016

• Comparison of left and right side line edge roughness in lithography

  • • Lei Sun
    • Nicole Saulnier
    • et al.
  • 2016
  • SPIE Advanced Lithography 2016

• Fin formation using graphoepitaxy DSA for FinFET device fabrication

  • • Chi Chun Liu
    • Fee Li Lie
    • et al.
  • 2015
  • SPIE Advanced Lithography 2015

• Scatterometry-based defect detection for DSA in-line process control

  • • Robin Chao
    • Chi Chun Liu
    • et al.
  • 2015
  • SPIE Advanced Lithography 2015