Nelson Felix

Publications

• Single-expose patterning development for EUV lithography

  • • Anuja De Silva
    • Karen Petrillo
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017

• Reaching for the true overlay in advanced nodes

  • • Chiew-Seng Koay
    • Bassem Hamieh
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017

• Printability and actinic AIMS review of programmed mask blank defects

  • • Erik Verduijn
    • Pawitter Mangat
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017

• A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

  • • Ruilong Xie
    • Pietro Montanini
    • et al.
  • 2016
  • IEDM 2016

• Design technology co-optimization assessment for directed self-Assembly-based lithography: Design for directed self-Assembly or directed self-Assembly for design

  • • Kafai Lai
    • Chi Chun Liu
    • et al.
  • 2017
  • J. Micro/Nanolithogr. MEMS MOEMS

• Study of alternate hardmasks for extreme ultraviolet patterning

  • • Anuja De Silva
    • Indira Seshadri
    • et al.
  • 2016
  • JVSTB

• FINFET technology featuring high mobility SiGe channel for 10nm and beyond

  • • Dechao Guo
    • G. Karve
    • et al.
  • 2016
  • VLSI Technology 2016

• Detection of printable EUV mask absorber defects and defect adders by full chip optical inspection of EUV patterned wafers

  • • Luciana Meli
    • Scott D. Halle
    • et al.
  • 2016
  • ASMC 2016

• Lithographic qualification of high-Transmission mask blank for 10nm node and beyond

  • • Yongan Xu
    • Tom Faure
    • et al.
  • 2016
  • SPIE Advanced Lithography 2016

• DSA via hole shrink for advanced node applications

  • • Cheng Chi
    • Chi Chun Liu
    • et al.
  • 2016
  • SPIE Advanced Lithography 2016