Absolute depth profiling of thin film systems by low energy secondary neutral mass spectrometry

Abstract

In secondary neutral mass spectrometry (SNMS) depth profiling the variation of time-dependent sputter removal rate can be evaluated from the sum of all SNMS signals. Hence, besides the quantitative sample composition the absolute depth scale can be determined if the particle density in the sample is known. Examples for such a complete analysis with respect to composition and depth are presented for NiCr multilayer systems with an individual layer thickness around 15 nm. © 1989.