Atomistic study of magneto-optical amorphous thin films using synchrotron radiation

Abstract

The x-ray scattering intensity from sputter-deposited amorphous Tb 24.3Fe75.7 films was measured using synchrotron radiation. The measurements show for the first time that the atomic structure in the film is anisotropic, and that the anisotropy is greatly reduced by annealing. The results can be explained in terms of elastic and anelastic stresses in the film, indicating that the growth-induced bond-orientational anisotropy is present in the film. It is suggested that the magnetic anisotropy due to such anelastic strain may be the origin of the observed magnetic anisotropy in the film.