Automatic Positioning of Device Electrodes Using the Scanning Electron Microscope

Abstract

In current technology, the edge definition that can be achieved by the photo resist process is approximately ten times sharper than the registration accuracy that can be maintained over a work piece of any reasonable size. A description is presented of an attempt to improve registration through feedback from the work piece itself; the servo signal is generated by the photo resisted posing radiation, a submicron-diameter electron beam. Using this technique, the gate electrode of a field-effect transistor (FET) has been automatically positioned relative to the channel. Copyright © 1965—THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, INC.