Axiotaxy of CoSi ₂ thin films on Si(100) substrates and the effects of Ti alloying

Abstract

The occurrence of axiotaxy in CoSi 2 thin films on Si(100) substrates and the effects of Ti alloying were discussed. The influence of Ti alloying was investigated by using in situ x-ray diffraction measurements, as well as pole figure analysis. It was found that the nucleation of both the CoSi and CoSi 2 phases is delayed to higher temperatures for the 5 at.% Ti alloyed films. It was also found that the texture of the CoSi 2 phase is also influenced by the addition of Ti.