Azide photoresists for projection photolithography

Abstract

The spectral sensitivity of bisazide sensitized rubbers has been extended to 5000Å by the addition of p‐azidocinnamylidene derivatives of cyclohexanone. The photoresists were suitable for projection exposure at 4050 and 4350 Hg lines. The photospeed of the compositions is enhanced by increasing the unsaturation of the polymer component. Speed increase could also be obtained by exposure of the films at elevated temperatures. Copyright © 1974 Society of Plastics Engineers, Inc.