Characterization of a Photoresist with Wavelength Selected Tone

Abstract

The line edge profile simulation of a novel, tone switching resist system, obtained from the dissolution model of dual sensitized, novolak-based resist in aqueous developer, is described. The model incorporates the actinic response of both a positive and a negative sensitizer in a two-pattern lithographic process, which simultaneously exposes the same resist film. These response data are combined with dissolution rate measurements to establish a model for the resist and carry out SAMPLE simulation of resist line edge profiles for contact and projection printing. The model predictions are compared with SEM micrographs of exposed resist features. © 1990 IEEE