Contact mechanics of a flexible imprinter for photocured nanoimprint lithography

Abstract

A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can transfer a pattern evenly to a non-flat substrate. These concepts have been used to pattern magnetic media for high density information storage. © 2005 Springer Science+Business Media. Inc.