Dependence of pattern dimensions on proximity functions in electron beam lithography

Abstract

The departure from the prescribed dimensions for simple patterns have been calculated as a function of proximity function parameters. Seven sets of proximity function parameters are used in this work. Using these, an attempt is made to delineate the effect of each parameter on variations in pattern dimensions. With parameters appropriate for high incident electron kinetic energies, it is shown that with increasing energy, even though the backward-scattered distribution increases, the proximity effect seems to decrease. Also, effects due to proximity function parameters appropriate to high-Z substrates are also investigated.