Direct patterning of NiB on glass substrates using microcontact printing and electroless deposition

Abstract

The direct patterning of NiB on glass substrates using microcontact printing and electroless deposition (ELD) was discussed. It was found that the Cartaretin F4 on the stamp tended to immobilize an excess of Pd/Sn compared to the amount of catalyst necessary to obtain a good strike of ELD. The characterization of the plated NiB patterns was also elaborated.