MULTICOMPONENT SPUTTER DEPOSITION UNDER ION BOMBARDMENT.

Abstract

The accumulated film grown under the influence of ion bombardment can be looked at as a frozen-in altered layer which represents the yield difference of the components. The ion energy and dose as well as the arrival rate of the species, the matrix, and the yield difference all act to affect the composition. This work reviews the processes and the system parameters that affect the composition of deposited films under the influence of ion bombardment.