ORGANOTIN POLYMERS: SYNTHESIS AND RESIST PROPERTIES.

Abstract

Two new classes of organotin polymers were synthesized containing tin pendent to a methacrylate polymer and tin in the polymer backbone. Homopolymers of the stannylalkyl methacrylates crosslinked upon e-beam exposure, whereas methyl methacrylate/stannylalkyl methacrylate copolymers degraded. A G-value study on several methyl methacrylate/stannylalkyl methacrylate copolymers showed that G//s for this series was slightly lower than PMMA, indicating that the incorporation of tin as a means of increasing the cross section of the resist had little impact on sensitivity. The polymers with tin in the polymer backbone were prepared by condensation of aminostannanes and alpha , omega -diynes, and crosslinked on e-beam exposure. Both stannylstyrene and stannylalkyl methacrylate polymers were found to be etch resistant to both oxygen and fluorocarbon based plasmas.