Photolithography experiments using forced Rayleigh scattering

Abstract

Phase conjugate wavefront generation by degenerate four-wave mixing has been used to project images with spatial resolution greater than 500 line pairs per millimeter. The nonlinear medium, a solution of rhodamine 6G in acetone, produced the images by forced Rayleigh scattering. These images were bright enough to expose photoresist in 30 sec and their quality was adequate for fine-line lithography and consistent with theoretical expectations.