Resists for Fine-Line Lithography

Abstract

Resists are radiation-sensitive materials used in the fabrica tion of integrated circuits (VLSI) for imaging the desired pattern onto the silicon wafer. Most resists in use today consist of polymeric solu tions that are spin-coated onto the silicon wafer, exposed in a litho graphic tool, developed, and completely removed after the pattem has been transferred to the substrate. This paper presents a historical development of resist materials, present uses of resists, and future re quirements, dictated primarily by developments in lithographic tools. Copyright © 1983 by The Institute of Electrical and Electronics Engineers, Inc.v