Secondary electron imaging by means of a microfabricated electron column

Abstract

This letter reports about the application of a miniaturized electron microscope for generating scanning secondary-electron images. The employed electrostatic lens-system was fabricated using silicon microfabrication techniques and a scanning tunneling microscope, operated in the field emission mode, was used as electron source. A resolution of better than 100 nm at a beam energy of 200 eV was achieved. © Les Éditions de Physique 1996.