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Plasma Chemistry and Plasma Processing
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Spatially resolved optical emission studies of fluorocarbon RF plasma through the use of UV-transmitting optical fibers

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Abstract

A technique for collecting spatially resolved optical emission from large rf plasma reactors is described. To demonstrate the sensitivity and versatility of this technique, emission within the quartz ultraviolet, 225-253 nm, was studied with particular emphasis on the "plasma dark space." Spatial variations of CF2, AlF, and C atom emission were monitored. These results have been used for discussion and evaluation of various plasma excitation and reaction mechanisms involving atomic carbon in fluorocarbon plasmas. © 1985 Plenum Publishing Corporation.

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Plasma Chemistry and Plasma Processing

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