The Kinetics and Mechanism of Film Growth during the Electrodeposition Process

Abstract

The kinetics and mechanism of film growth during the electrodeposition process is investigated by galvanostatic and potentiostatic methods. The theory of oxide film growth is applied to the data and is shown to give a consistent and accurate picture of the film growth kinetics. A nonlinear exponential relationship between current density and field strength exists similar to that found for oxide film growth. A substantial dissolution current for the electrodeposited organic films results in rapid attainment (90-120 s) of a limiting film thickness. The limiting film thickness is directly proportional to the applied voltage. The potentiostatic film growth equation is numerically solved in dimensionless form and the theoretical equation shown to fit experimental data taken at several voltages. © 1978, American Chemical Society. All rights reserved.