Three-Dimensional Nanostructure Construction via Nanografting: Positive and Negative Pattern Transfer

Abstract

Three-dimensional nanostructures can be constructed using scanning probe lithography in combination with selective surface reactions. This letter introduces a successful approach using AFM-based nanografting to produce two-dimensional nanopatterns within self-assembled monolayer resists. These nanopatterns serve as an anchor to construct nanostructures in the third dimension via surface reactions. In this way, the nanometer-scale 20 pattern is transferred to chemically distinct 3D nanostructures. This approach offers the advantages of high spatial precision and selectivity in pattern transfer.