Wear-resistant fluorinated diamondlike carbon films

Abstract

Fluorinated diamondlike carbon (FDLC) films have been deposited on Si wafers by rf plasma-assisted chemical vapor deposition, under a variety of conditions. The films have been characterized by FTIR and index of refraction measurements, RBS and FRES analysis for determination of film composition, and stress measurements from the bending of the wafers by the deposited films. Friction and wear measurements have been performed using pin-on-flat and pin-on-disk testers in ambient air, at maximum Hertzian contact pressures ranging from 320 to 1100 MPa. By adjusting the deposition parameters, the properties of the FDLC films could be changed from soft films, with no significant wear resistance, to films containing more than 20% F and having wear resistance comparable to unfluorinated DLC. The tribological properties of the FDLC films are discussed in relation to their physical properties, as determined by the deposition conditions. © 1997 Elsevier Science S.A.