Comparison of annealing and ion implantation effects during solid state disilicide formation
- F.M. D'Heurle
- M.Y. Tsai
- et al.
- 1982
- Journal of Applied Physics
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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24 results for C.S. Petersson
Diffusion marker experiments with rare-earth silicides and germanides: Relative mobilities of the two atom species
- J.E.E. Baglin
- F.M. D'Heurle
- et al.
- 1981
- Journal of Applied Physics
Properties of tungsten silicide film on polycrystalline silicon
- M.Y. Tsai
- F.M. D'Heurle
- et al.
- 1981
- Journal of Applied Physics
Tantalum silicide films deposited by dc sputtering
- J. Angilello
- J.E.E. Baglin
- et al.
- 1981
- Journal of Electronic Materials