A method for increasing the etch-rate ratio of oxides to nonoxides in inert-gas ion milling processes
- U. Gerlach-Meyer
- J.W. Coburn
- et al.
- 2008
- Journal of Applied Physics
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.