Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1992
- Microlithography 1992
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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58 results for Scott A. MacDonald
Polymer effects on the photochemistry of triarylsulfonium salts
- D.R. McKean
- R.D. Allen
- et al.
- 1991
- SPIE San Diego 1991
Top-surface-imaging resist for deep UV lithography
- Scott A. MacDonald
- H. Schlosser
- et al.
- 1991
- International Technical Conference on Photopolymers 1991
Airborne chemical contamination of a chemically amplified resist
- Scott A. MacDonald
- N.J. Clecak
- et al.
- 1991
- Microlithography 1991
Silylation of poly (t-BOC) styrene resists: Performance and mechanisms
- C.A. Spence
- S.A. Macdonald
- et al.
- 1990
- Microlithography 1990
1X deep UV lithography with chemical amplification for 1-micron DRAM production
- John G. Maltabcs
- Steven J. Holmes
- et al.
- 1990
- Microlithography 1990
Silicon-rich surfaces in polymer resists
- R.D. Allen
- Scott A. MacDonald
- 1989
- International SAMPE Electronics Conference 1989
Investigations on the structural morphology of sulfonium salt containing polymethacrylate films
- R.D. Allen
- U. Schaedeli
- et al.
- 1989
- ACS PMSE 1989
Polymeric matrix effects on the efficiency of acid generation from triphenylsulfonium salts
- D.R. McKean
- U. Schaedeli
- et al.
- 1989
- ACS PMSE 1989
Acid photogeneration from sulfonium salts in solid polymer matrices
- D.R. McKean
- U. Schaedeli
- et al.
- 1988
- ACS PMSE 1988