Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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27 results for R.D. Thompson

Thermal stability of the Al/Pd_xW_100-x/Si contact systems
- - M. Eizenberg
  - R.D. Thompson
  - et al.
- 1985
- Journal of Applied Physics
Phase transformations of alloys on a reactive substrate: Interaction of binary alloys of transition and rare-earth metals with silicon
- - R.D. Thompson
  - K.N. Tu
  - et al.
- 1985
- Journal of Applied Physics
Effect of dopant on reaction between polycrystalline silicon and thin-film rhodium
- - P.A. Psaras
  - R.D. Thompson
  - et al.
- 1985
- Applied Physics Letters
Structure and growth kinetics of RhSi on single crystal, polycrystalline, and amorphous silicon substrates
- - P.A. Psaras
  - R.D. Thompson
  - et al.
- 1984
- Journal of Applied Physics
Interaction of Pd-Er alloys with silicon
- - G. Ottaviani
  - K.N. Tu
  - et al.
- 1983
- Journal of Applied Physics
Interdiffusion in copper-aluminum thin film bilayers. I. Structure and kinetics of sequential compound formation
- - H.T.G. Hentzell
  - R.D. Thompson
  - et al.
- 1983
- Journal of Applied Physics
Motion of W marker during sequential compound formation in bimetallic AlCu thin films
- - H.T.G. Hentzell
  - R.D. Thompson
  - et al.
- 1983
- Materials Letters
Schottky barrier of nonuniform contacts to n-type and p-type silicon
- - R.D. Thompson
  - K.N. Tu
- 1982
- Journal of Applied Physics
Thermal stability and growth kinetics of Co₂Si and CoSi in thin-film reactions
- - K.N. Tu
  - G. Ottaviani
  - et al.
- 1982
- Journal of Applied Physics
A simple analysis of inert marker motion in a single compound layer for solid-phase epitaxy and for binary diffusion couples
- - U. Gösele
  - K.N. Tu
  - et al.
- 1982
- Journal of Applied Physics