A comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers
- E. Babich
- J. Paraszczak
- et al.
- 1985
- Microelectronic Engineering
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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36 results for Jurij Paraszczak
Mechanism of oxygen plasma etching of polydimethyl siloxane films
- N.J. Chou
- C.H. Tang
- et al.
- 1985
- Applied Physics Letters
Methods of creation and effect of microwave plasmas upon the etching of polymers and silicon
- J. Paraszczak
- J. Heidenreich
- et al.
- 1985
- Microelectronic Engineering
A new method for determining electron beam proximity correction parameters in a double layer siloxane-diazo resist system
- Fletcher Jones
- Jurij Paraszczak
- et al.
- 1984
- Journal of Applied Physics
SUMMARY ABSTRACT: CHARACTERISTICS OF ORGANOSILICON POLYMERS IMMERSED IN GASEOUS PLASMAS.
- J. Paraszczak
- E. Babich
- et al.
- 1984
- Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
RD3D 〈Computer Simulation of Resist Development in Three Dimensions〉
- Fletcher Jones
- Jurij Paraszczak
- 1981
- IEEE T-ED