Poly(methyl α‐trifluoromethylacrylate) as a positive electron beam resist
- C. Grant Willson
- Hiroshi Ito
- et al.
- 2004
- Polymer Engineering & Science
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.