A SIMS study of ion-assisted etching mechanisms; adsorbed fluorine on Si removed by ion bombardment
- E.-A. Knabbe
- J.W. Coburn
- et al.
- 1982
- Surface Science
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.