Mechanism of microwave plasma etching of polyimides in O2 and CF4 gas mixtures
- N.J. Chou
- J. Parazsczak
- et al.
- 1986
- Microelectronic Engineering
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.