Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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18 results for Mark A. Jaso

Mechanism of silicon surface roughening by reactive ion etching
- - Gottlieb S. Oehrlein
  - Robert G. Schad
  - et al.
- 2004
- Surface and Interface Analysis
Octagonal Washer De Squids and Integrated Susceptometers Fabricated in a Planarized Sub-^Im Nb - A10X - Nb Technology
- - M.B. Ketchen
  - D.J. Pearson
  - et al.
- 1993
- IEEE TAS
Sub-μm linewidth input coils for low T_c integrated thin-film dc superconducting quantum interference devices
- - M.B. Ketchen
  - K. Stawiasz
  - et al.
- 1992
- Applied Physics Letters
Sub-μm, planarized, Nb-AlO_x-Nb Josephson process for 125 mm wafers developed in partnership with Si technology
- - M.B. Ketchen
  - D.J. Pearson
  - et al.
- 1991
- Applied Physics Letters
A photoemission investigation of surface processes affecting the reactive ion etching of TiSi₂ in CF₄
- - S.W. Robey
  - M.A. Jaso
  - et al.
- 1989
- Journal of Applied Physics
Surface analysis of realistic semiconductor microstructures
- - Gottlieb S. Oehrlein
  - Kevin K. Chan
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
In situ spatially resolved surface characterization of realistic semiconductor structure after reactive ion etching process
- - Gottlieb S. Oehrlein
  - Kevin K. Chan
  - et al.
- 1988
- Journal of Applied Physics
Transient fluorocarbon film thickness effects near the silicon dioxide/silicon interface in selective silicon dioxide reactive ion etching
- - Mark A. Jaso
  - Gottlieb S. Oehrlein
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films