Study of near‐surface disorder and surface residues after reactive Ion etching of Silicon
- G.S. Oehrlein
- G.J. Coyle
- et al.
- 2004
- Surface and Interface Analysis
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2 results for G.J. Coyle
Summary Abstract: Reactive ion-etching-related Si surface residues and subsurface disorder
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 1986
- JVSTA