Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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8 results for S.W. Robey

Surface Modifications of Electronic Materials Induced by Plasma Etching
- - G.S. Oehrlein
  - S.W. Robey
  - et al.
- 2019
- JES
A photoemission investigation of surface processes affecting the reactive ion etching of TiSi₂ in CF₄
- - S.W. Robey
  - M.A. Jaso
  - et al.
- 1989
- Journal of Applied Physics
Fluorination of the silicon dioxide surface during reactive ion and plasma etching in halocarbon plasmas
- - S.W. Robey
  - G.S. Oehrlein
- 1989
- Surface Science
Technique for selective etching of Si with respect to Ge
- - A.A. Bright
  - Subramanian S. Iyer
  - et al.
- 1988
- Applied Physics Letters
Surface processes in CF₄/O₂ reactive etching of silicon
- - Gottlieb S. Oehrlein
  - Steve W. Robey
  - et al.
- 1988
- Applied Physics Letters
Medium energy ion scattering analysis of reactive ion etched Si(001) surfaces
- - M. Copel
  - R.M. Tromp
  - et al.
- 1988
- Applied Physics Letters
Valence-band photoemission and electron energy-loss studies of reactive ion etched silicon dioxide
- - S.W. Robey
  - G.S. Oehrlein
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
X-ray photoemission spectroscopy characterization of silicon surfaces after CF₄/H₂magnetron ion etching: Comparisons to reactive ion etching
- - Gottlieb S. Oehrlein
  - Arthur A. Bright
  - et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films