Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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51 results for D.A. Buchanan

Modeling and characterization of n⁺- and p⁺-polysilicon-gated ultra-thin oxides (21-26 angstroms)
- - S.H. Lo
  - D.A. Buchanan
  - et al.
- 1997
- VLSI Technology 1997
Degradation of thin SiO ₂ gate oxides by atomic hydrogen
- - F. Cartier
  - D.J. DiMaria
  - et al.
- 1994
- DRC 1994
Measurements of hydrogen redistribution in hot electron injection of MOS capacitors
- - A.D. Marwick
  - D.A. Buchanan
  - et al.
- 1992
- MRS Proceedings 1992
Electron effective mass in ultrathin oxide silicon MOSFET inversion layers
- - M. Dragosavac
  - D.J. Paul
  - et al.
- 2005
- Semiconductor Science and Technology
Interface reactions in ZrO ₂ based gate dielectric stacks
- - M. Gribelyuk
  - A.C. Callegari
  - et al.
- 2002
- Journal of Applied Physics
Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates
- - Tiezhong Ma
  - Stephen A. Campbell
  - et al.
- 2001
- IEEE Transactions on Electron Devices
Ultrathin high-K gate stacks for advanced CMOS devices
- - E. Gusev
  - D.A. Buchanan
  - et al.
- 2001
- Technical Digest - International Electron Devices Meeting
Low temperature chemical vapor deposition of ZrO₂ on Si(100) using anhydrous zirconium(IV) nitrate
- - Ryan C. Smith
  - Noel Hoilien
  - et al.
- 2000
- JES
Scaling the gate dielectric: materials, integration, and reliability
- - D.A. Buchanan
- 1999
- IBM J. Res. Dev
Ultrathin nitrided gate dielectrics by plasma-assisted processing
- - E. Gusev
  - D.A. Buchanan
  - et al.
- 1999
- Microelectronic Engineering