Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for D. Angell

Etch tailoring through flexible end-point detection
- - D. Angell
  - G.S. Oehrlein
- 1990
- SPIE Processing Integration 1990
Principal Component Analysis of Optical Emission Spectroscopy and Mass Spectrometry: Application to Reactive Ion Etch Process Parameter Estimation Using Neural Networks
- - Reza Shadmehr
  - David Angell
  - et al.
- 2019
- JES
Grazing angle optical emission interferometry for end-point detection
- - David Angell
  - Gottlieb S. Oehrlein
- 1991
- Applied Physics Letters
Cryogenic reactive ion etching of silicon in SF₆
- - Tim D. Bestwick
  - Gottlieb S. Oehrlein
  - et al.
- 1990
- Applied Physics Letters
Study of oxygen addition to CF₃Br reactive ion etching plasmas: Effects on silicon surface chemistry and etching behavior
- - T.D. Bestwick
  - G.S. Oehrlein
  - et al.
- 1989
- Applied Physics Letters