Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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8 results for M. Anderle

Nucleation and growth of silicon on Si02 during SiH4 low pressure chemical vapor deposition as studied by hydrogen desorption titration
- - M. Liehr
  - S.S. Dana
  - et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Thin-film transformations and volatile products in the formation of nanoporous low- k polymethylsilsesquioxane-based dielectric
- - P. Lazzeri
  - L. Vanzetti
  - et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
ToF-SIMS studies of nanoporous PMSSQ materials: Kinetics and reactions in the processing of low-K dielectrics for ULSI applications
- - P. Lazzeri
  - G.W. Rubloff
  - et al.
- 2004
- Surface and Interface Analysis
Subatmospheric chemical vapor deposition ozone/TEOS process for SiO₂ trench filling
- - I.A. Shareef
  - G.W. Rubloff
  - et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Role of implantation-induced defects in surface-oriented diffusion of fluorine in silicon
- - Cs. Szeles
  - B. Nielsen
  - et al.
- 1994
- Journal of Applied Physics
Chemical vapor deposition of rough-morphology silicon films over a broad temperature range
- - S.S. Dana
  - M. Anderle
  - et al.
- 1993
- Applied Physics Letters
Anomalous diffusion of fluorine in silicon
- - S.-P. Jeng
  - T.P. Ma
  - et al.
- 1992
- Applied Physics Letters
Kinetics of nucleation and growth of Si on SiO₂ in very low pressure SiH₄ chemical vapor deposition
- - S.S. Dana
  - M. Liehr
  - et al.
- 1992
- Applied Physics Letters