High contact angle fluorosulfonamide-based materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.