Band-edge high-performance metal-gate/high-κ nMOSFET using Hf-Si/HfO 2 stack
- Takashi Ando
- Tomoyuki Hirano
- et al.
- 2009
- IEEE Transactions on Electron Devices
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.