Exposure tool settings and OPC strategies for EUV Lithography at the 16nm node
- Yunfei Deng
- Jongwook Kye
- et al.
- 2009
- SPIE Advanced Lithography 2009
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.