Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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13 results for Wenjie Li

Post-modification as a way to improve the lithographic performance of resist materials
- - Wenjie Li
  - P. Rao Varanasi
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- - T. Kajita
  - Y. Nishimura
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Extending the performance of KRS-XE for high throughput electron beam lithography for advanced mask making
- - David R. Medeiros
  - Karen E. Petrillo
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering