Improvements in accuracy of dense OPC models
- Chidam Kallingal
- James Oberschmidt
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.