Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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39 results for Linda K. Sundberg
Fluoroalcohol-methacrylate resists for 193nm lithography
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Oxygen Assisted Lithium-Iodine Batteries: Towards Practical Iodine Cathodes and Viable Lithium Metal Protection Strategies
- Maxwell J. Giammona
- Jangwoo Kim
- et al.
- 2023
- Advanced Materials Interfaces
Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
- Ramakrishnan Ayothi
- Lovejeet Singh
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
A fundamental study on dissolution behavior of high-resolution molecular glass photoresists
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2008
- Chemistry of Materials
Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
- Vivek M. Prabhu
- Sharadha Sambasivan
- et al.
- 2006
- Applied Surface Science
Porous organosilicates low-dielectric films for high-frequency devices
- André Knoesen
- Ge Song
- et al.
- 2004
- Journal of Electronic Materials
Templating of silsesquioxane cross-linking using unimolecular self-organizing polymers
- Eric F. Connor
- Linda K. Sundberg
- et al.
- 2003
- Angewandte Chemie - International Edition
Versatile synthesis of nanometer sized hollow silica spheres
- Jeroen J. L. M. Cornelissen
- Eric F. Connor
- et al.
- 2003
- Chemical Communications