The effect of the OPC parameters on the performance of the OPC model
- Amr Abdo
- Ahmed Seoud
- et al.
- 2007
- SPIE Photomask Technology + EUV Lithography 2007
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.