Exploring acidic functionalities in the design and development of high performance 193nm photoresist polymers
- P.R. Varanasi
- W. Li
- et al.
- 2007
- J. Photopolym. Sci. Tech.
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.