Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography
- W.H. Teh
- U. Dürig
- et al.
- 2005
- Journal of Applied Physics
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2 results for W.H. Teh
SU-8 for real three-dimensional subdiffraction-limit two-photon microfabrication
- W.H. Teh
- U. Dürig
- et al.
- 2004
- Applied Physics Letters