Relationship between copper concentration and stress during electromigration in an Al(0.25 at.% Cu) conductor line
- H.K. Kao
- G.S. Cargill III
- et al.
- 2003
- Journal of Applied Physics
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.