Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for Jonathan Cobb

Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography
- - G.M. Gallatin
  - F.A. Houle
  - et al.
- 2003
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Extendibility of chemically amplified amplified resists: Another brick wall?
- - William Hinsberg
  - Frances Houle
  - et al.
- 2003
- Microlithography 2003
The estimated impact of shot noise in extreme ultraviolet lithography
- - Jonathan Cobb
  - Frances Houle
  - et al.
- 2003
- Microlithography 2003
EUV photoresist performance results from the VNL and the EUV LLC
- - Jonathan Cobb
  - Paul Dentinger
  - et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
Dynamics of a Charged Fluctuator in an Al-AlO_x-Al Single-Electron Transistor
- - M. Kenyon
  - J.L. Cobb
  - et al.
- 2001
- Journal of Low Temperature Physics