PREVAIL - A high throughput e-beam projection approach for next generation lithography
- Hans C. Pfeiffer
- 1999
- IMNC 1999
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4 results for H.C. Pfeiffer
PREVAIL-EPL alpha tool: Early results
- S.D. Golladay
- H.C. Pfeiffer
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
- H.C. Pfeiffer
- R.S. Dhaliwal
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Projection reduction exposure with variable axis immersion lenses (PREVAIL)-a high throughput E-beam projection approach for next generation lithography
- Hans C. Pfeiffer
- 1999
- Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers