Polymer platform dependent characteristics of 193 nm photoresists
- Juliann Opitz
- R.D. Allen
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.