Utilizing surface modification in plasma-enhanced cyclic etching of tantalum nitride to surpass lithographic limits
- Nathan Marchack
- Keith Hernandez
- et al.
- 2019
- Plasma Processes and Polymers
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.